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Cheol Seong Hwang 교수와 관련된 세부정보입니다.
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Cheol Seong Hwang

Department Department of Materials Science and Engineering,Hybrid Materials Position Full Professor
Tel 880-7535
Major Electronic materials
Minor Dielectric thin films
Location 33-111
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  • Seoul National University: Ph.D. in Inorganic Materials Engineering (1993)
  • Seoul National University: M.S. in Inorganic Materials Engineering (1989)
  • Seoul National University: B.S. in Inorganic Materials Engineering (1987)

Major areas of research

1. DRAM capacitor dielectric films and process integration
- (Ba,Sr)TiO3, SrTiO3, TiO2, BixTiySizO, Al2O3/HfO2 bi-layer dielectrics film research by MOCVD and ALD
- Metal electrode (Ru, Pt) MOCVD
- Metal (Ru, Pt)/poly-Si electrodes and barrier integration
- New structure and integration schemes

2. High-k gate dielectric films for MOSFETs
- Al2O3, HfO2, HfxSi1-xO2, TiO2 films by MOCVD and ALD
- Poly-Si/metal electrode integration
- Long channel and short channel MOSFET fabrication

3. Ferroelectric thin films and devices
- Pb(Zr,Ti)O3 thin film growth by MOCVD and ALD
- FeRAM device integration and reliability

4. New memory devices
- Resistive change random access memories
- Phase change random access memories

5. Dielectric phenomenology of high dielectric films and Leakage current mechanism for MIM and MIS capacitors
- C-V, I-V and P-V measurement in wide temperature range and phase transition behavior of thin film ferroelectrics
- modeling the leakage current phenomena and prove the model using numerical analysis


  • Seoul National University, Associate professor (1998-present)
  • Germany Forschungzentrum Juelich research center (2004)
  • Samsung Electronics R&D Center (1994-1997)
  • NIST, Post-Doctorial Research Fellow (1993-1994)
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