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SNU Researcher Noh Hyun-Jun received the American Vacuum Society Student Award
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SNU Researcher Noh Hyun-Jun received the American Vacuum Society Student Award
-Developed element technology necessary for automation of Semiconductor/Display manufacturing process
▲ SNU Department of Energy and System Engineering researcher Noh Hyun-Jun (left), advisory professor Kim Gon-Ho (right)
On 23rd, SNU College of Engineering (Dean Cha Kook-Heon) has announced that researcher Noh Hyun-Jun (advisor Kim Gon-Ho) of Department of Energy and System Engineering became the first Korean to receive John Coburn and Harold Winters Student Award in the 64th AVS International Symposium & Exhibition 2017
His paper, ‘Virtual Measurement Technology of Nitride Thin Film in Multilayer Thin Film Deposition Process Using Plasma Information’, developed a plasma information factor for real-time diagnosis of semiconductor and display device manufacturing process environment, and proposed a new process diagnosis method that uses this as a core element in virtual measurement model.
Through this paper, Research Noh has proved that the silicon multilayer thin film deposition process for manufacturing 3D-VNAND can more than double the measurement accuracy compared with the existing virtual measurement technology. In addition, it has pioneered a new research field of plasma process diagnosis by suggesting a method to monitor the contamination status of the equipment wall in real time during plasma process.
The research was supported by the Industrial Technology Innovation Project of Ministry of Trade Industry and Energy, the Plasma Big data ICT Convergence Technology Research Project of the National Fusion Research Institute, and the business support of the National Research Foundation of Korea BK21 Plus.
AVS International Symposium and Exhibition is recognized as one of the world’s leading academic societies in the field of industrial application of low-temperature plasma.
Among them, AVS’s Plasma Science & Technology Division honored the work of Jonh Coburn and Harold Winters, who pioneered semiconductor plasma processes and plasma surface interaction, by establishing ‘John Coburn and Harold Winters Student Award’ in 1994. World-class researchers have received this award, such as Erwin Kessels (Eindhoven University of Technology) and Jane Chang (UCLA).